JPH0319482B2 - - Google Patents
Info
- Publication number
- JPH0319482B2 JPH0319482B2 JP57189952A JP18995282A JPH0319482B2 JP H0319482 B2 JPH0319482 B2 JP H0319482B2 JP 57189952 A JP57189952 A JP 57189952A JP 18995282 A JP18995282 A JP 18995282A JP H0319482 B2 JPH0319482 B2 JP H0319482B2
- Authority
- JP
- Japan
- Prior art keywords
- test object
- components
- interferometer
- reflected
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8132745 | 1981-10-30 | ||
GB8132745 | 1981-10-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5885103A JPS5885103A (ja) | 1983-05-21 |
JPH0319482B2 true JPH0319482B2 (en]) | 1991-03-15 |
Family
ID=10525503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57189952A Granted JPS5885103A (ja) | 1981-10-30 | 1982-10-28 | 表面プロフイル干渉計 |
Country Status (3)
Country | Link |
---|---|
US (1) | US4534649A (en]) |
JP (1) | JPS5885103A (en]) |
DE (1) | DE3240234C2 (en]) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4848908A (en) * | 1983-10-24 | 1989-07-18 | Lockheed Missiles & Space Company, Inc. | Optical heterodyne roughness measurement system |
US5133601A (en) * | 1991-06-12 | 1992-07-28 | Wyko Corporation | Rough surface profiler and method |
DE4138562C2 (de) * | 1991-11-25 | 1995-11-23 | Fraunhofer Ges Forschung | Mikroprofilometermeßkopf |
US5469259A (en) * | 1994-01-03 | 1995-11-21 | International Business Machines Corporation | Inspection interferometer with scanning autofocus, and phase angle control features |
DE19626261A1 (de) * | 1995-06-30 | 1997-01-02 | Nikon Corp | Beobachtungsvorrichtung |
JP3534363B2 (ja) * | 1995-07-31 | 2004-06-07 | パイオニア株式会社 | 結晶レンズ及びこれを用いた光ピックアップ光学系 |
US5784163A (en) * | 1996-09-23 | 1998-07-21 | International Business Machines Corporation | Optical differential profile measurement apparatus and process |
US5926266A (en) * | 1996-09-23 | 1999-07-20 | International Business Machines Corporation | Optical apparatus for rapid defect analysis |
US5703684A (en) * | 1996-09-23 | 1997-12-30 | International Business Machines Corporation | Apparatus for optical differential measurement of glide height above a magnetic disk |
JP3559452B2 (ja) * | 1998-06-23 | 2004-09-02 | ペンタックス株式会社 | 自動焦点検出測量機の遮光構造 |
US6181430B1 (en) | 1999-03-15 | 2001-01-30 | Ohio Aerospace Institute | Optical device for measuring a surface characteristic of an object by multi-color interferometry |
AU1377601A (en) * | 1999-11-24 | 2001-06-04 | Haag-Streit Ag | Method and device for measuring the optical properties of at least two regions located at a distance from one another in a transparent and/or diffuse object |
US6580509B1 (en) * | 2000-04-24 | 2003-06-17 | Optical Physics Company | High speed high resolution hyperspectral sensor |
US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
US7453641B2 (en) * | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
US6844972B2 (en) | 2001-10-30 | 2005-01-18 | Mcguire, Jr. James P. | Reducing aberration in optical systems comprising cubic crystalline optical elements |
US6995908B2 (en) * | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
WO2003038479A2 (en) * | 2001-10-30 | 2003-05-08 | Optical Research Associates | Structures and methods for reducing aberration in optical systems |
US7072102B2 (en) | 2002-08-22 | 2006-07-04 | Asml Netherlands B.V. | Methods for reducing polarization aberration in optical systems |
US20090066970A1 (en) * | 2007-05-21 | 2009-03-12 | Muetec Automatisierte Mikroskopie Und Messtechnik Gmbh | Arrangement and method for improving the measurement accuracy in the nm range for optical systems |
GB0713982D0 (en) * | 2007-07-18 | 2007-08-29 | Univ Birmingham | Improved interferometer |
DE102013005187A1 (de) | 2013-03-20 | 2014-09-25 | Carl Zeiss Microscopy Gmbh | Verfahren zur Ermittlung von Rauheit- und/oder Topographiedaten von Oberflächen in der Materialmikroskopie |
US9784570B2 (en) | 2015-06-15 | 2017-10-10 | Ultratech, Inc. | Polarization-based coherent gradient sensing systems and methods |
TWI575221B (zh) * | 2015-11-20 | 2017-03-21 | 財團法人工業技術研究院 | 表面粗度檢測系統及其方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2851750B1 (de) * | 1978-11-30 | 1980-03-06 | Ibm Deutschland | Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche |
JPS567006A (en) * | 1979-06-22 | 1981-01-24 | Ibm | Method of extending measurement range of interference |
JPS6017041A (ja) * | 1983-07-08 | 1985-01-28 | Sumitomo Electric Ind Ltd | ワイアカツト放電加工用電極線 |
-
1982
- 1982-10-22 US US06/436,336 patent/US4534649A/en not_active Expired - Fee Related
- 1982-10-28 JP JP57189952A patent/JPS5885103A/ja active Granted
- 1982-10-29 DE DE3240234A patent/DE3240234C2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3240234A1 (de) | 1983-05-11 |
DE3240234C2 (de) | 1995-01-05 |
JPS5885103A (ja) | 1983-05-21 |
US4534649A (en) | 1985-08-13 |
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